Advanced Technologies Based on Wave and Beam Generated Plasmas

This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It encompasses all the links in the progress from fundamentals to applications: the description and modelling of different plasma sources to technological use; from general diagnostics to methods related to technological control and operation of plasma reactors. The book lays a foundation for the application of sources in industry (in high-tech electronics, microelectronics, IC fabrication, plasma chemistry, lighting, new materials, optics, the biomedical industry, aerospace, etc.), and in astrophysics, atomic physics, laser physics, accelerator physics and microwave devices.

שנה

1999

שפה

English

סדרה

NATO ASI Series, 3. High Technology -- 67

הוצאה

Springer Netherlands

מהדורות

4

עמודים

569

ISBN

9789401706339

מקור הנתונים: Wikidata