Chemical solution deposition of semiconductor films
Gary Hodes · 2002
על הספר
This reference examines the processes involved in the deposition of semiconductor films by chemical solution deposition and explains the effect of various process parameters on final film and film deposition outcomes through the use of detailed examples-discussing specific depositions of a wide range of semiconductors and properties of the resulting films.Chemical Solution Deposition of Semiconductor Films detailsthe fundamental scientific principles underlying the chemical deposition processthe various mechanisms involved in depositionfilms of all the semiconductors deposited by this technique, including binary sulphides, selenides, oxides, ternary semiconductors, and some miscellaneous compoundsthe use of semiconductor films in photovoltaics, photoelectrochemical properties, and size quantization effectsSupplying experimental results and practical examples, Chemical Solution Deposition of Semiconductor Films is a valuable guide for a wide range of scientists, engineers, and students who use this increasingly popular technique for application in fields such as materials, semiconductors, energy conversion, coating technologies, optical materials, quantum dots, and nanocrystals; and overlaps into the field of biomineralization.
פרטי הספר
- שנה
- 2002
- שפה
- English
- הוצאה
- Taylor & Francis Group
- מהדורות
- 5
- עמודים
- 388
- ISBN
- 9781135564988
מקור הנתונים: Wikidata
