Ionized-cluster beam deposition and epitaxy

The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.

שנה

1989

שפה

English

הוצאה

Elsevier Science & Technology Books

מהדורות

1

ISBN

9780815518174

מקור הנתונים: Wikidata