Multiscale modeling in epitaxial growth

Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.

שנה

2005

שפה

English

סדרה

International series of numerical mathematics -- v. 149

הוצאה

Birkhäuser

מהדורות

4

עמודים

237

ISBN

9783764372081

מקור הנתונים: Wikidata