NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

שנה

1994

שפה

English

סדרה

NATO ASI Series, Series E: Applied Sciences -- 264

הוצאה

Springer Netherlands

מהדורות

1

עמודים

215

ISBN

9789048143887

מקור הנתונים: Wikidata