The Physics of Submicron Lithography

This monograph details the physics behind the methods of generating submicron forms for electron beam, ion beam, optical, and X-ray lithography. Topics are discussed at the level of analytical theory, allowing a study of scientific issues in the field without frequent reference to a general physics text.

שנה

1992

שפה

English

סדרה

Microdevices, Physics and Fabrication Technologies

הוצאה

Springer US

מהדורות

1

עמודים

493

ISBN

9781461364610

מקור הנתונים: Wikidata