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Advances in CMP/polishing technologies for the manufacture of electronic devices

Toshiro K. Doi, Ioan D. Marinescu, Syuhei Kurokawa · 2012

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About the book

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. --P. 4 of cover.

Book details

Year
2012
Language
English
Publisher
Elsevier
Editions
1
Pages
317
ISBN
9781437778595

Data source: Wikidata