Ionized-cluster beam deposition and epitaxyToshinori Takagi

Ionized-cluster beam deposition and epitaxy

Name: Ionized-cluster beam deposition and epitaxy
ISBN: 9780815518174

Toshinori Takagi · 1989

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About the book

The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.

Book details

Year: 1989
Language: English
Publisher: Elsevier Science & Technology Books
Editions: 1
ISBN: 9780815518174

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