NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies
M. Gentili · 1994
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Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Book details
- Year
- 1994
- Language
- English
- Series
- NATO ASI Series, Series E: Applied Sciences -- 264
- Publisher
- Springer Netherlands
- Editions
- 1
- Pages
- 215
- ISBN
- 9789048143887
Data source: Wikidata